技術文章
Technical articles針對(dui)光學和介電功能薄膜制備(bei)中(zhong)的(de)(de)(de)(de)(de)離(li)化(hua)率低和靶(ba)(ba)面污(wu)染(ran)(ran)問(wen)題,設(she)(she)計(ji)(ji)了一種磁(ci)控濺(jian)射(she)沉(chen)積(ji)系統(tong),系統(tong)包括磁(ci)控濺(jian)射(she)靶(ba)(ba)裝(zhuang)(zhuang)置(zhi)(zhi)、等離(li)子體源和陽(yang)極清洗裝(zhuang)(zhuang)置(zhi)(zhi)。主要結論有:(1)在磁(ci)控濺(jian)射(she)靶(ba)(ba)裝(zhuang)(zhuang)置(zhi)(zhi)設(she)(she)計(ji)(ji)中(zhong),采用(yong)(yong)磁(ci)流(liu)體密(mi)封(feng)(feng)(feng)替代橡膠軸承(cheng)密(mi)封(feng)(feng)(feng),提高(gao)了靶(ba)(ba)裝(zhuang)(zhuang)置(zhi)(zhi)的(de)(de)(de)(de)(de)密(mi)封(feng)(feng)(feng)性,極限(xian)真空度可達(da)10-6Pa;采用(yong)(yong)旋轉磁(ci)鋼(gang)代替固定磁(ci)鋼(gang),使靶(ba)(ba)材的(de)(de)(de)(de)(de)利用(yong)(yong)率從(cong)30%提高(gao)到60%,同(tong)時(shi)避免了靶(ba)(ba)裝(zhuang)(zhuang)置(zhi)(zhi)在預先清洗時(shi)的(de)(de)(de)(de)(de)污(wu)染(ran)(ran);設(she)(she)計(ji)(ji)了靶(ba)(ba)裝(zhuang)(zhuang)置(zhi)(zhi)的(de)(de)(de)(de)(de)驅動端(duan),完成了電機、傳動裝(zhuang)(zhuang)置(zhi)(zhi)和軸承(cheng)的(de)(de)(de)(de)(de)選(xuan)型。(2)設(she)(she)計(ji)(ji)等離(li)子體源來改善沉(chen)積(ji)系統(tong)離(li)化(hua)率不足的(de)(de)(de)(de)(de)問(wen)題。選(xuan)擇0.2mm鎢絲(si)...
集成(cheng)電路自動化裝備-探(tan)(tan)針臺是(shi)晶圓測(ce)試領域研(yan)究(jiu)的熱點。由于(yu)晶圓片上晶粒(li)很(hen)小,達(da)到(dao)微(wei)米(mi)級(ji)(ji),所以要(yao)求探(tan)(tan)針臺要(yao)保(bao)持(chi)很(hen)高的定位精(jing)度(du)(du)和運動精(jing)度(du)(du)才能(neng)保(bao)證探(tan)(tan)針與晶粒(li)的準確對針和測(ce)試。因此,本文(wen)(wen)主(zhu)要(yao)研(yan)究(jiu)的問(wen)題是(shi)如何保(bao)證探(tan)(tan)針臺高精(jing)密控(kong)制,從而達(da)到(dao)微(wei)米(mi)級(ji)(ji)定位要(yao)求。本文(wen)(wen)來自于(yu)國(guo)家02專項(xiang)-面向12”晶圓片的全自動探(tan)(tan)針臺關鍵技術研(yan)究(jiu)。首先,本文(wen)(wen)介紹了探(tan)(tan)針臺兩大部(bu)分(fen)-LOADER和PROBER的關鍵結(jie)構和運動流程；其次,本文(wen)(wen)重點對預對位、Z軸升降、XY平臺三個關鍵部(bu)件(jian)的精(jing)準控(kong)制進(jin)行研(yan)究(jiu),分(fen)析影響(xiang)控(kong)制精(jing)度(du)(du)...
紅(hong)(hong)外(wai)(wai)(wai)熱(re)(re)成像(xiang)技(ji)(ji)術由(you)于(yu)自身(shen)各(ge)種優勢(shi)在(zai)軍事(shi)領(ling)域和民(min)用(yong)(yong)領(ling)域有著(zhu)廣闊的(de)應用(yong)(yong)前景,因此(ci)備受各(ge)國(guo)(guo)重視,競相發(fa)展相關(guan)技(ji)(ji)術。由(you)于(yu)國(guo)(guo)外(wai)(wai)(wai)對紅(hong)(hong)外(wai)(wai)(wai)熱(re)(re)成像(xiang)技(ji)(ji)術的(de)研(yan)(yan)(yan)究(jiu)(jiu)比較早,而我國(guo)(guo)在(zai)紅(hong)(hong)外(wai)(wai)(wai)熱(re)(re)成像(xiang)技(ji)(ji)術領(ling)域起(qi)步較晚,所以差距很(hen)(hen)大。近年來我國(guo)(guo)在(zai)紅(hong)(hong)外(wai)(wai)(wai)熱(re)(re)成像(xiang)技(ji)(ji)術的(de)相關(guan)領(ling)域取得(de)了一些進(jin)展,但很(hen)(hen)多方面還(huan)(huan)是遠遠落后于(yu)世界(jie)水(shui)平。因此(ci),還(huan)(huan)需(xu)要加(jia)快紅(hong)(hong)外(wai)(wai)(wai)熱(re)(re)成像(xiang)技(ji)(ji)術的(de)研(yan)(yan)(yan)究(jiu)(jiu)。本課(ke)題(ti)以加(jia)快紅(hong)(hong)外(wai)(wai)(wai)熱(re)(re)成像(xiang)技(ji)(ji)術的(de)研(yan)(yan)(yan)究(jiu)(jiu)進(jin)度、減(jian)小研(yan)(yan)(yan)究(jiu)(jiu)周期、提升研(yan)(yan)(yan)究(jiu)(jiu)效率,降(jiang)低研(yan)(yan)(yan)究(jiu)(jiu)及生產成本為目標,以紅(hong)(hong)外(wai)(wai)(wai)熱(re)(re)成像(xiang)系統的(de)核心部(bu)分非制冷(leng)紅(hong)(hong)外(wai)(wai)(wai)焦平面為基(ji)礎,研(yan)(yan)(yan)究(jiu)(jiu)紅(hong)(hong)外(wai)(wai)(wai)焦平面封(feng)裝前...
Q1:什(shen)么是(shi)(shi)(shi)(shi)PVD?真空(kong)(kong)電(dian)鍍加工真空(kong)(kong)鍍膜(mo)技術A1:PVD是(shi)(shi)(shi)(shi)英文PhysicalVaporDeposition的縮寫，中文意(yi)思是(shi)(shi)(shi)(shi)“物理氣(qi)相沉(chen)積”，是(shi)(shi)(shi)(shi)指在真空(kong)(kong)條件(jian)(jian)下，用物理的方(fang)法使材料(liao)沉(chen)積在被鍍工件(jian)(jian)上的薄膜(mo)制備技術。鄭(zheng)州科探(tan)儀器(qi)設備有(you)(you)限公司(si)新研發(fa)一款小(xiao)型(xing)蒸(zheng)鍍儀KT-Z1650DM是(shi)(shi)(shi)(shi)一款小(xiao)型(xing)臺式加熱(re)功(gong)(gong)(gong)率可控蒸(zheng)發(fa)鍍膜(mo)儀，儀器(qi)雖小(xiao)功(gong)(gong)(gong)能(neng)齊全，配(pei)備有(you)(you)電(dian)壓電(dian)流反饋,樣品臺旋轉，樣品高度調(diao)(diao)節(jie)，及(ji)電(dian)動擋板功(gong)(gong)(gong)能(neng)。通過定時(shi)調(diao)(diao)節(jie)預熱(re)功(gong)(gong)(gong)率及(ji)蒸(zheng)發(fa)功(gong)(gong)(gong)率，可對大部(bu)分金屬(shu)進行均(jun)勻蒸(zheng)發(fa)沉(chen)積，真空(kong)(kong)腔(qiang)室(shi)為透明石英玻璃...
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